The model of the reactive sputtering process has been determined from the dynamic equilibrium of the reactive gas inside the chamber and the dynamic equilibrium of the sputtered metal atoms which form the compound with the reactive gas atoms on the surface of the substrate. The analytically obtained dynamical model is a system of nonlinear differential equations which can result in a hysteresis-type input/output nonlinearity. The reactive sputtering process has been simulated by integrating these differential equations. Linearization has been applied for classical analysis of the sputtering process and control system design.

Automatic control of reactive sputtering process involves controlling the state of the electrical discharge plasma and the definition of control variables. Obtaining a thin film with a determined constant structure and composition, involves maintaining in every part of the substrate and at all time of the deposition process a constant number of collisions, i.e. activated plasma density. This condition is greatly hampered by the dynamics of surface phenomena that occur at the sputtered target.

This paper presents some achievements of the project entitled “Disseminating Open and Innovative Tools and Services for Vocational Education and Training in Quality Assurance” (acronym Do-IT) financed by European Commission. The recent developments and results obtained during pilot testing of new pedagogical models and services, in Do-IT project, targeting engineering education in Romania are presented. This includes the activity Based Training methodology (ABT) for quality management system audit course according to ISO 19011 and ISO 9001. ABT focuses on delivering theoretical content linking directly theory and practice according to the industrial production path of an object. The testing of the theoretical and practical achievements has been done using Student Response System (SRS), by using individual voting systems.